Silicon Glass Plate
Product Details:
Silicon (Si) is commonly used for 3-5 µm imaging applications. Widespread use of this material in the semiconductor industry has driven the price of silicon down, making it the least expensive of IR materials.Silicon (Si)is commonly used for 3-5 µm imaging applications. Widespread use of this material in the semiconductor industry has driven the price of silicon down, making it the least expensive of IR materials. It is readily available, lightweight and possesses very good thermal and mechanical durability. Although silicon has some absorption in the 8-12 µm range, the low power levels of these imaging applications make it a suitable choice. Silicon is not used for CO2 transmitting optics because of high absorption characteristics, however, it is widely used in mirror applications due to its high thermal conductivity and mechanical characteristics.It is ideal for weight sensitive applications, especially those in the 3 - 5µm region. Density is 2.329 g/cm3 and Knoop Hardness is 1150, making it harder and less brittle than Germanium.
Mechanical Specifications:
Substrate material : Silicon
Physical Specifications:
Diameter : 10 CM
thickness :> 1 mm
It is also useful as a transmitter in the 20 micron range It is ideal for weight sensitive applications