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High-Temperature Oven Chamber:
HTK-1200N
The HTK 1200N is an advanced high-temperature chamber with a robust design for in-situ X-ray diffraction studies in different atmospheres up to 1200 °C. Its environmental heater guarantees excellent uniformity of the sample temperature. Use the HTK 1200N for different types of in-situ X-ray investigations, including studies of phase transformations, structure determination, and studies of chemical reactions.
Key Features
Precise temperature measurement and control
- Highly reliable temperature measurement right at the sample
- Excellent temperature uniformity in the sample
- Almost no restrictions on sample thickness
Sample spinning is crucial
- Sample spinning option for optimum data quality
- Sample carriers of various chemically resistant materials available
- Quick exchange of sample carriers for easy sample preparation
The ideal tool for a wide range of applications
- Robust and compact design using high quality materials
- Fits most available goniometers
- Available with automated motorized z-aligment stage for temperature-dependent sample realignment
Technical specifications :
Operating temperature | 25 °C to 1200 °C |
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Temperature measurement | Pt 10% RhPt thermocouple |
Atmospheres | Vacuum (10-4 mbar), air, inert gases |
Max. operating pressure | 1 bar above atmospheric pressure |
Angle of incidence | 0 to 164° 2Θ |
Sample holder material | Aluminum oxide |
Sample diameter | max. 16 mm |
Measurement geometry | Reflection + transmission |